: Thin film preparation techniques

03-22-2010, 04:09 PM
Thin film preparation techniques

Film synthesis techniques used in the laboratory are based in physical or chemical vapor deposition of thin films (physical vapour deposition or PVD (http://www.icmm.csic.es/fis/english/pvd.html) and chemical vapour deposition or CVD (http://www.icmm.csic.es/fis/english/cvd.html), respectively). In both cases, the techniques are based in the formation of vapor of the material to be deposited, so that the vapor is condensed on the substrate surface as a thin film. Usually the process must be performed in vacuum or in controlled atmosphere, to avoid interaction between vapor and air.

Process diagram


In physical techniques (PVD) (http://www.icmm.csic.es/fis/english/pvd.html) we part from a solid material converted to vapor through heating

(evaporation) or energetic ion bombardment. The material in form of vapor finally condeses on the substrate surface as a thin film.

In chemical techniques (CVD) (http://www.icmm.csic.es/fis/english/cvd.html) we part directly from gases (sometimes vapor originating from a liquid phase) which react and give place to a new product that condenses as a thin film on the substrate.

Other film synthesis techniques include high temperature thermal oxidation and anodic oxidation


09-19-2011, 04:20 PM
svp la prochaine fois, dir la prparation des films minces par broyage mcanique haute-nergie c..d la mcanosynthse